Magnetron Sputtering Ruthenium Target High Purity

• Type: Alloy Target
• Shape: Round
• Purity: 99.99%
• Material: Ru
• Transport Package: Plywood Box
• Specification: 100mm*6mm(customized)
• Trademark: Gravel
• Origin: China
• HS Code: 8486909100
• Production Capacity: 10000

Product Description

Since the year 2009, our company has been investing and developing the technology of vacuum sputtering thin film coating and evaporation coating for chips of semi-conductor and mirco-electronics, etc. Under technical supports from reserch institutes and doctors/professors of overseas returnees, after many years practice, we owned the target manufacture and thin film coating technology professional engineering team and excellent sales groups.

We build and provide customized high purity and high quality vacuum sputtering targets, vacuum evaporation pellets in precious metal, alloy, ceramic and different materials. The targets size could be certain thickness in round, oval and rectangle, etc. We could provide both single target and the target with the backing plate bonded




FAQ:
Q1: What kinds of the quality control on you provided products?
A1:TQC for raw material, manufacture, outgoing, and customer service.

Q2:How you can quickly response to the customer requests?
A2: We own professional product engineers with attitude of customer satisfaction, good products resources management.

Q3: Do you think your products with competitive price?
A3: We fully implement the ISO9001 quality management system, at the same time, we have a strict cost management system, coupled with the optimization of manufacturing control, and the lowest scrap rate.